Deposition machines:

Ion Beam Sputtering (IBS) system – IBS@LAB (Cutting Edge Coatings).

Electron Beam Evaporation (e-beam) system – VERA 1100 (VTD Vakuumtechnik Dresden GmbH).

Magnetron Sputtering (MS) system – Kurt J. Lesker PVD 225.

Atomic Layer Deposition (ALD) system – SAVANNAH 200.

Ultrasonic Cleaning Machine – UCS-40.

Characterization set-ups:

Atomic Force Microscope (AFM) – Nanowizard 3.

Multipurpose automated laser stand for LIDT and CRD:

• Laser NL121-20 Ekspla with I-IV harmonics.
• Microscope – Leica DM6 M with automatic specimen positioning.
• Oscilloscope – Tektronix TDS2012C.

LID setup (1064 nm, 532 nm and 355 nm)

Birefringence measurement system

Atomic force microscopy (AFM)

Scanning electron microscopy (SEM)

Profilometer

Microscope – Olympus BX41 with dark field contrast.

Most deposition and characterization processes take place in a cleanroom, meeting ISO6 cleanroom standard.