Characterization set-ups:

Atomic Force Microscope (AFM) – Nanowizard 3.

Multipurpose automated laser stand for laser induced damage threshold (LIDT) and cavity ring-down setup (CRD):

• Laser NL121-20 Ekspla with I-IV harmonics.
• Microscope – Leica DM6 M with automatic specimen positioning.
• Oscilloscope – Tektronix TDS2012C.

Laser induced deflection (LID) setup for absorption measurements (1064 nm, 532 nm and 355 nm wavelengths)

Birefringence measurement system – Thorlabs (488 nm wavelength)

Atomic force microscopy (AFM)

Microscope – Leica DM6 M

Microscope – Olympus BX41 with dark field contrast.

Deposition machines:

Ion Beam Sputtering (IBS) system – IBS@LAB (Cutting Edge Coatings).

Electron Beam Evaporation (e-beam) system – VERA 1100 (VTD Vakuumtechnik Dresden GmbH).

Magnetron Sputtering (MS) system – Kurt J. Lesker PVD 225.

Atomic Layer Deposition (ALD) system – SAVANNAH 200.

Ultrasonic Cleaning Machine – UCS-40.

Most deposition and characterization processes take place in a cleanroom, meeting ISO6 cleanroom standard.